Our company was established in 2006 as a small manufacturer of equipment, specializing in semiconductor lithography mask alignment of development and manufacturing of the exposure and the exposure source, the light box from the optical exposure within the design to complete various types of exposure the company after years of efforts have been developed entirely completed and shipped many customers at home and abroad, deep acclaim.
High yield automatic exposure machine, alignment process can produce 250 or more per hour, no registration process can produce 350 or more per hour, the wafer transfer automatic machines for the automatic input and output, the output of the industry’s highest , twice the other brands models.
Optional light intensity flyback type power supply to the light intensity inside the box detectors do feedback control signal, the light intensity output enables long-time stable, uniform beam generated by the array of lenses, making pattern transfer can effectively reduce the exposure light diffraction.
Digital display panel output power and voltage and current values, internal electromagnetic contactor do overload protection, rear connectors output power box fan, light boxes and overtemperature protection interlock circuit, good operating performance, good stability, high durability, the most suitable production line.
There is no content, do not know what to write, you just write it to occupy layout. But in many ways, when we catch the Bund sidewalk, formal dance, eventually everybody will applaud, I built this company, Cool !!
If your machine with our product no business conflicts, welcome to buy our exposure source.
Fragments do wafer alignment, the two lenses because spacing restrictions, can not see the left and right images simultaneously, using a suitable lens, moving left and right to adjust the alignment of the lens to watch the situation, it can be used in conjunction with a quick scan station bit rate speed up.
After mercury lamps, light bulbs need to be increase in temperature, the mercury has evaporated into a gaseous state, the power to reach the set value, if the wind speed is too strong heat caused by the lamp does not heat up, the power can not be increased, the intensity of the beam will be very weak.
We have a simple exposure, there is no image registration function, it may be suitable for your application.
Wafer placement available flat mouth forceps wafer edge, if the line of particulate tolerate relatively high process can even upload glove hand pick and place wafers.
Our standard exposure light source, a wavelength range of NUV (Near UV) containing I-line, H-line, G-line three beam for your needs.