Mask Aligner Introduction

UV light source

The company has production capacity parallel to the UV light source,
UV light source comprises a light box with the power supply,
The light source has a size of 4 “, 6”, 8 “, 10” and 10 “above
Light wavelength: NUV (G, H, I line),
Power supply has power: 200W, 350W, 500W, 1000W, 2000W, 3500W, 5000W
There are high-pressure mercury lamp power 200W, 250W, 350W, 500W, 1000W, 2000W, 3500W, 5000W

Alignment Fixture

Wafer and reticle Mining vacuum in the mask and the wafer holder base, the wafer holder and the mask can be made in various sizes of seat.
Wafer holder do X, Y, Z, adjustment of δ.
Mask and the wafer do collimated to achieve the best resolution of the exposure.
Exposure mode vacuum adsorption, direct contact and close-up mode.

Microscopic Imaging System

Microscopic imaging system with adjustable magnification of the lens + CCD imaging system display screen can be designed to meet the alignment align key size magnification ratio generally have a 50X-300X, 100X-600X.
Can do fine tuning of the lens to look around, align key, do up and down to fine-tune the focus.
Usually dual lens design to facilitate the alignment of conduct, if adopted single-lens design, the lens can be used to do the scanning station about fast-moving,
Backside alignment system also uses an adjustable magnification of the imaging system, a small ratio can be adjusted to align key to speed up the find, a large ratio can be adjusted in alignment with the high-resolution.

Control system and the base

Can be taken full manual button operation system or human-machine boundary PLC referral system
Cylinder drive mechanism moves the mining,
Z-axis position of the dial gauge can be read
Timer time setting: 0.1-999 seconds
Thick aluminum base to add ribs to achieve the production of sufficient rigidity

Anti-earthquake tables

Good desk to avoid the shock CCD imaging system for image viewing high magnification when the vibration problem.
Earthquake vibration isolation tables to the floor of the airbag.