Large area UV source parallel light exposure

Parallel light shift to parallel reflective aluminum mirror, the exposure area can be to 60cmx60cm, light intensity 5kW bulbs, 60cm square of NUV light beam of the I-line output intensity of about 15mW / cm2, uniformity of plus or minus 5% to 8%, the light source parallel by half-light of different caliber in about 1.5 to 2.5 degrees. suitable for large area of the substrate exposure process.