UV light source models have power 350W, 500W, 1000W, 2000W
Exposure source size: 4 “, 6”, 8 “, 10”, 12 “, round or square,
Wavelength: NUV (including 365nm, 405nm, 435nm),
Half-width parallel light source: 1.5 to 2.5 degrees (depending on the light aperture)
Uniformity: -3 to + 5%
High pressure mercury lamp and power supply
With variable magnification lens easy alignment operation, the total standard magnification 50X-300X,
CCD camera imaging system, LCD screen
Coaxial lighting with LED light or ring light
Two observations pitch 4cm-20cm, turning mirror can be installed to a smaller spacing
Lens can be installed scanning station to quickly move the camera,
Optional on the back of the alignment imaging system
Mask vacuum cups: the suction or downdraft 4 “, 5”, 6 “, 7″, 9 ”
Wafer vacuum cups: 2 ‘, 4 “, 5”, 6 “, 8”, round or square,
A mask wafer level correction function
Exposure mode vacuum contact and proximity, size adjustable vacuum suction force
X, Y axis adjustment 10mm. To adjust the sensitivity 1um
Z-axis adjustable 5mm, micrometer resolution 1um
Open hand on a reticle substrate to take place
Full manual operating system, each action required manual operation,
Operational procedures: counter substrate, manually shut down the reticle chuck, the lens alignment operation moved to do, move to the exposure position on chuck, the lens moved out of the light source exposure (timing),
Light source is removed, the mask sucker open, remove the board.
Exposure timer time setting: 0.1-999 seconds
With four shockproof cushion, with adjustable feet, moving wheels, stainless steel bracket and disk, desktops and aluminum ribs, adjusting the CDA, the display of a vacuum, and so the power output.
